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Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates

Peer-reviewed
Open access
DOI
10.1149/2.0261809jss
Kukli, Kaupo; Kemell, Marianna; Castan, Helena; Duenas, Salvador; Seemen, Helina; Rähn, Mihkel; Link...
ECS Journal of Solid State Science and Technology2018Publications information icon

Controlled growth of HfO2 thin films by atomic layer deposition from cyclopentadienyl-type precursor and water

Peer-reviewed
Niinistö, Jaakko; Putkonen, Matti; Niinistö, Lauri; Stoll, Sarah; Kukli, Kaupo; Sajavaara, Timo; Rit...
Journal of Materials Chemistry2005Publications information icon

Electric and Magnetic Properties of Atomic Layer Deposited ZrO2-HfO2 Thin Films

Peer-reviewed
Open access
DOI
10.1149/2.0041809jss
Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Ritslaid, Peeter; Stern, Raivo; Duenas, Salvador; Cas...
ECS Journal of Solid State Science and Technology2018Publications information icon

ATOMIC LAYER DEPOSITION HfO2 FILM USED AS BUFFER LAYER OF THE Pt/(Bi0.95Nd0.05)(Fe0.95Mn0.05)O3/HfO2/Si CAPACITORS FOR FeFET APPLICATION

Peer-reviewed
Xie, D.; Feng, T.; Luo, Y; Han, Xueguang; Ren, T; Bosund, Markus; Li, S.; Airaksinen, Veli-Matti; Li...
JOURNAL OF ADVANCED DIELECTRICS2011Publications information icon

Thermal Atomic Level Etching of Al2O3, HfO2, TiN and SiGe

Open access
Sharma, Varun
Helsingin yliopisto2023Publications information icon

A study of III-V/HfO2 interfaces and silicon structure optimization 

Open access
Ahtela Elina
University of Turku2023Publications information icon

Unusual oxidation-induced core-level shifts at the HfO2/InP interface

Peer-reviewed
Open access
DOI
10.1038/s41598-018-37518-2
Mäkelä J, Lahti A, Tuominen M, Yasir M, Kuzmin M, Laukkanen P, Kokko K, Punkkinen MPJ, Dong H, Brenn...
Scientific Reports2019Publications information icon

Atomic layer deposition of HfO2 on graphene from HfCl4 and H2O

Peer-reviewed
DOI
10.2478/s11534-010-0040-x
Alles, Harry; Aarik, Jaan; Aidla, Aleks; Fay, Aurelien; Kozlova, Jekaterina; Niilisk, Ahti; Pärs, Ma...
Central European Journal of Physics2011Publications information icon

Influence of HfO2 control oxide ALD precursor chemistry for nitride memories

Peer-reviewed
DOI
10.4028/www.scientific.net/AMR.324.42
Nikolaou, N.; Dimitrakis, P.; Normand, P.; Ioannou-Sougleridis, V.; Giannakopoulos, K.; Mergia, K.; ...
Advanced materials research2011Publications information icon

Nucleation and Growth of the HfO2 Dielectric Layer for Graphene-Based Devices

Peer-reviewed
DOI
10.1021/acs.chemmater.5b01226
Oh Il-Kwon, Tanskanen Jukka, Jung Hanearl, Kim Kangsik, Lee Mi Jin, Lee Zonghoon, Lee Seoung-Ki, Lee...
CHEMISTRY OF MATERIALS2015

Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates

Peer-reviewed
Open access
DOI
10.1149/2.0261809jss
2018

Controlled growth of HfO2 thin films by atomic layer deposition from cyclopentadienyl-type precursor and water

Peer-reviewed
2005

Electric and Magnetic Properties of Atomic Layer Deposited ZrO2-HfO2 Thin Films

Peer-reviewed
Open access
DOI
10.1149/2.0041809jss
2018

ATOMIC LAYER DEPOSITION HfO2 FILM USED AS BUFFER LAYER OF THE Pt/(Bi0.95Nd0.05)(Fe0.95Mn0.05)O3/HfO2/Si CAPACITORS FOR FeFET APPLICATION

Peer-reviewed
2011

Thermal Atomic Level Etching of Al2O3, HfO2, TiN and SiGe

Open access
2023

A study of III-V/HfO2 interfaces and silicon structure optimization 

Open access
2023

Unusual oxidation-induced core-level shifts at the HfO2/InP interface

Peer-reviewed
Open access
DOI
10.1038/s41598-018-37518-2
2019

Atomic layer deposition of HfO2 on graphene from HfCl4 and H2O

Peer-reviewed
DOI
10.2478/s11534-010-0040-x
2011

Influence of HfO2 control oxide ALD precursor chemistry for nitride memories

Peer-reviewed
DOI
10.4028/www.scientific.net/AMR.324.42
2011

Nucleation and Growth of the HfO2 Dielectric Layer for Graphene-Based Devices

Peer-reviewed
DOI
10.1021/acs.chemmater.5b01226
2015