Influence of atomic layer deposition chemistry on high-k dielectrics for charge trapping memories
Year of publication
2012
Authors
Nikolaou, Nikolaos; Dimitrakis, Panagiotis; Normand, Pascal; Ioannou-Sougleridis, Vassilios; Giannakopoulos, Konstantinos; Mergia, Konstantina; Kukli, Kaupo; Niinistö, Jaakko; Ritala, Mikko; Leskelä, Markku
Organizations and authors
Publication type
Publication format
Article
Parent publication type
Journal
Article type
Original article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A1 Journal article (refereed), original researchPublication channel information
Journal/Series
Parent publication name
Volume
68
Pages
38-47
ISSN
Publication forum
Open access
Open access in the publisher’s service
No information
Self-archived
Unknown
Other information
Fields of science
Chemical sciences
Identified topic
[object Object]
Publication country
United Kingdom
Internationality of the publisher
International
Language
English
International co-publication
Yes
Co-publication with a company
Unknown
DOI
10.1016/j.sse.2011.09.016
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes