Atomic Layer Deposition
Year of publication
2021
Authors
van Ommen, J. Ruud; Goulas, Aristeidis; Puurunen, Riikka L.
Organizations and authors
Aalto University
Puurunen Riikka 
Publication type
Publication format
Article
Parent publication type
Compilation
Article type
Other article
Audience
ScientificPeer-reviewed
Non Peer-ReviewedMINEDU's publication type classification code
B2 Book sectionPublication channel information
Parent publication name
Publisher
JOHN WILEY & SONS
Pages
1-42
ISBN
Open access
Open access in the publisher’s service
No
Self-archived
No
Other information
Fields of science
Chemical engineering
Keywords
[object Object],[object Object],[object Object],[object Object],[object Object]
Internationality of the publisher
International
Language
English
International co-publication
Yes
Co-publication with a company
No
DOI
10.1002/0471238961.koe00059
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes