Data set for paper 'Impact of post-ion implantation annealing on Se-hyperdoped Ge'
Description
Description of the files
Files are named by the same figure order appearing in the paper and supplementary material. File types contain:
- *.csv: Comma separated values.
- *.fibps: Raw data obtained with the 3D optical profilometer, which can be opened and analyzed by ProfilmOnline at https://www.profilmonline.com/. Figures shown in the paper were croped from the top-left corner with areas of about 60x60 µm2 from the raw data. Alternatively all 3D profilometer data shown in the paper can be obtained and analyzed in https://www.profilmonline.com/shared-folder?token=S32NP82HtLC3
- *.tif: Image generated from scanning electron microscope.
Original paper: https://doi.org/10.1063/5.0213637
Supplementary material: https://doi.org/10.60893/figshare.apl.c.7322108
When using the dataset, please cite the original paper: Xiaolong Liu, Patrick McKearney, Sören Schäfer, Behrad Radfar, Yonder Berencén, Ulrich Kentsch, Ville Vähänissi, Shengqiang Zhou, Stefan Kontermann, Hele Savin; Impact of post-ion implantation annealing on Se-hyperdoped Ge. Appl. Phys. Lett. 22 July 2024; 125 (4): 042102. https://doi.org/10.1063/5.0213637.
Show moreYear of publication
2024
Authors
Department of Electronics and Nanoengineering
Patrick Mc Kearney - Contributor
Shengqiang Zhou - Contributor
Stefan Kontermann - Contributor
Sören Schäfer - Contributor
Ulrich Kentsch - Contributor
Yonder Berencen - Contributor
Helmholtz-Zentrum Dresden-Rossendorf - Contributor
RheinMain University of Applied Sciences - Contributor
Zenodo - Publisher
Other information
Fields of science
Electronic, automation and communications engineering, electronics
Open access
Open
License
Creative Commons Attribution 4.0 International (CC BY 4.0)