Data set for paper 'Impact of post-ion implantation annealing on Se-hyperdoped Ge'

Data set for paper 'Impact of post-ion implantation annealing on Se-hyperdoped Ge'

Description

Description of the files Files are named by the same figure order appearing in the paper and supplementary material. File types contain: - *.csv: Comma separated values. - *.fibps: Raw data obtained with the 3D optical profilometer, which can be opened and analyzed by ProfilmOnline at https://www.profilmonline.com/. Figures shown in the paper were croped from the top-left corner with areas of about 60x60 µm2 from the raw data. Alternatively all 3D profilometer data shown in the paper can be obtained and analyzed in https://www.profilmonline.com/shared-folder?token=S32NP82HtLC3 - *.tif: Image generated from scanning electron microscope. Original paper: https://doi.org/10.1063/5.0213637 Supplementary material: https://doi.org/10.60893/figshare.apl.c.7322108 When using the dataset, please cite the original paper: Xiaolong Liu, Patrick McKearney, Sören Schäfer, Behrad Radfar, Yonder Berencén, Ulrich Kentsch, Ville Vähänissi, Shengqiang Zhou, Stefan Kontermann, Hele Savin; Impact of post-ion implantation annealing on Se-hyperdoped Ge. Appl. Phys. Lett. 22 July 2024; 125 (4): 042102. https://doi.org/10.1063/5.0213637.
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Year of publication

2024

Authors

Department of Electronics and Nanoengineering

Behrad Radfar Orcid -palvelun logo - Contributor

Hele Savin Orcid -palvelun logo - Contributor

Patrick Mc Kearney - Contributor

Shengqiang Zhou - Contributor

Stefan Kontermann - Contributor

Sören Schäfer - Contributor

Ulrich Kentsch - Contributor

Ville Vähänissi Orcid -palvelun logo - Contributor

Yonder Berencen - Contributor

Xiaolong Liu Orcid -palvelun logo - Creator

Helmholtz-Zentrum Dresden-Rossendorf - Contributor

RheinMain University of Applied Sciences - Contributor

Zenodo - Publisher

Other information

Fields of science

Electronic, automation and communications engineering, electronics

Open access

Open

License

Creative Commons Attribution 4.0 International (CC BY 4.0)

Data set for paper 'Impact of post-ion implantation annealing on Se-hyperdoped Ge' - Research.fi