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ALD on particles: Literature collection and dataset
Simulated thickness profiles of ALD film in a wide microchannel of 500 nm height published as Fig.4 in PCCP 24 (2022) 8645-8660
DReaM-ALD – Diffusion-Reaction Model for Atomic Layer Deposition
ALD Al2O3 thickness profile in microscopic rectangular channel, TMA-water 300 degC 500 cycles, PillarHall(TM) LHAR3-1b, V0001
Examples of ALD saturation profiles in rectangular channel LHAR structures simulated with a diffusion-reaction model
Displaying results 1 - 5 / 5
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