Displaying results 1 - 1 / 1
results / page
What research data information is included in the service?
Name
Authors / organizations
Year
Research data information icon

Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism

Open access
DOI10.1021/acs.chemmater.1c00142.s002
Marko Tuominen, Michael E. Givens, Mikko Ritala, Simon Elliott, Suvi Haukka, Tom Blomberg, Varun Sharma2021
Open access
DOI10.1021/acs.chemmater.1c00142.s002

Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism

Open access
DOI10.1021/acs.chemmater.1c00142.s002
2021