Atomic Layer Deposition as key enabler of scalable and stable perovskite solar cells

Description of the granted funding

We will develop new preparation methods for thin film materials needed in halide perovskite solar cells. Our aim is to find solutions the two major issues that currently hamper the development of the otherwise promising halide perovskite technology. The issues are instability of the halide perovskites and the lack of scalable preparation methods. Our approach relies on atomic layer deposition (ALD), a unique method that enables the deposition of uniform films on large areas. The work will be done at the department of chemistry, University of Helsinki. The project will provide information on the effects of preparation conditions on film properties. The new methods will be applicable also to other devices such as LEDs. In the long term, the methods developed here can promote the transition to sustainable energy production.
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Starting year

2020

End year

2024

Granted funding

Marianna Kemell Orcid -palvelun logo
500 280 €

Funder

Research Council of Finland

Funding instrument

Academy projects

Other information

Funding decision number

330086

Fields of science

Chemical sciences

Research fields

Epäorgaaninen kemia

Identified topics

solar cells, solar energy