Photo-Atomic Layer Printing

Description of the granted funding

Chip manufacturing is resource-intensive relying on critical raw materials (CRMs). Methods are rigid to change and sensitive to issues in supply chains. Essential thin-film patterning by photolithography makes lots of toxic waste. Needed better chip performance adds environmental risks in manufacturing. Objectives: Proof of concept, photolithography-free-thin-film deposition equipment for chip manufacturing with Photo-assisted Atomic Layer Deposition. New process chemistries enabling direct pattern printing. Validated technology via novel neuromorphic chips in sensors and memristors. Communicate, disseminate, and scale up the developed solutions. PhotoPrint will enable novel chip designs, like neuromorphics, and circuitry on various products. Beyond the project, PhotoPrint will revolutionize chip manufacturing with reduced environmental footprint. PhotoPrint will be accessible to a broad audience, facilitating inclusiveness and microelectronics for a sustainable and responsible society
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Starting year

2025

End year

2028

Granted funding

Ville Miikkulainen Orcid -palvelun logo
299 737 €

Funder

Research Council of Finland

Funding instrument

International joint call

Decision maker

Suomen akatemian muu päättäjä
03.04.2025

Other information

Funding decision number

372234

Fields of science

Chemical sciences

Research fields

Epäorgaaninen kemia

Identified topics

nuclear safety, nuclear reactors