Photo-Atomic Layer Printing
Description of the granted funding
Chip manufacturing is resource-intensive relying on critical raw materials (CRMs). Methods are rigid to change and sensitive to issues in supply chains. Essential thin-film patterning by photolithography makes lots of toxic waste. Needed better chip performance adds environmental risks in manufacturing. Objectives: Proof of concept, photolithography-free-thin-film deposition equipment for chip manufacturing with Photo-assisted Atomic Layer Deposition. New process chemistries enabling direct pattern printing. Validated technology via novel neuromorphic chips in sensors and memristors. Communicate, disseminate, and scale up the developed solutions. PhotoPrint will enable novel chip designs, like neuromorphics, and circuitry on various products. Beyond the project, PhotoPrint will revolutionize chip manufacturing with reduced environmental footprint. PhotoPrint will be accessible to a broad audience, facilitating inclusiveness and microelectronics for a sustainable and responsible society
Show moreStarting year
2025
End year
2028
Granted funding
Funder
Research Council of Finland
Funding instrument
International joint call
Decision maker
Suomen akatemian muu päättäjä
03.04.2025
03.04.2025
Other information
Funding decision number
372234
Fields of science
Chemical sciences
Research fields
Epäorgaaninen kemia
Identified topics
nuclear safety, nuclear reactors