Nucleation and Growth of the HfO2 Dielectric Layer for Graphene-Based Devices
Year of publication
2015
Authors
Oh Il-Kwon, Tanskanen Jukka, Jung Hanearl, Kim Kangsik, Lee Mi Jin, Lee Zonghoon, Lee Seoung-Ki, Lee Jong-Hyun, Lee Chang Wan, Kim Kwanpyo, Kim Hyungjun, Lee Han-Bo-Ram
Organizations and authors
University of Eastern Finland
Tanskanen Jukka
Publication type
Publication format
Article
Parent publication type
Journal
Article type
Original article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A1 Journal article (refereed), original researchPublication channel information
Journal
Volume
27
Issue
17
Pages
5868-5877
ISSN
Publication forum
Publication forum level
3
Open access
Open access in the publisher’s service
No information
Self-archived
Unknown
Other information
Fields of science
Chemical sciences
Internationality of the publisher
International
Language
English
International co-publication
Yes
Co-publication with a company
Unknown
DOI
10.1021/acs.chemmater.5b01226
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes