Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)(3) and H2O

Year of publication

2014

Authors

Aarik, Lauri; Alles, Harry; Aidla, Aleks; Kahro, Tauno; Kukli, Kaupo; Niinisto, Jaakko; Mandar, Hugo; Tamm, Aile; Rammula, Raul; Sammelselg, Vaino; Aarik, Jaan

Organizations and authors

University of Helsinki

Niinisto Jaakko

Kukli Kaupo

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Thin Solid Films

Parent publication name

Thin Solid Films

Volume

565

Pages

37-44

ISSN

0040-6090

Publication forum

68419

Publication forum level

Open access

Open access in the publisher’s service

No information

Self-archived

Unknown

Other information

Fields of science

Chemical sciences

Publication country

Switzerland

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company