Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Year of publication

2014

Authors

Ylivaara, Oili M.E.; Liu, Xuwen; Kilpi, Lauri; Lyytinen, Jussi; Schneider, Dieter; Laitinen, Mikko; Julin, Jaakko; Ali, Saima; Sintonen, Sakari; Berdova, Maria; Haimi, Eero; Sajavaara, Timo; Ronkainen, Helena; Lipsanen, Harri; Koskinen, Jari; Hannula, Simo Pekka; Puurunen, Riikka L.

Organizations and authors

VTT Technical Research Centre of Finland Ltd

Ronkainen Helena

Kilpi Lauri

Ylivaara Oili M.E.

Puurunen Riikka L.

Aalto University

Haimi Eero

Lipsanen Harri

Koskinen Jari

Lyytinen Jussi

Berdova Maria

Ylivaara Oili

Puurunen Riikka

Ali Saima

Sintonen Sakari

Hannula Simo-Pekka

Liu Xuwen

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Thin solid films

Volume

552

Pages

124-135

ISSN

0040-6090

Publication forum

68419

Publication forum level

Open access

Open access in the publisher’s service

Self-archived

Yes

License of the self-archived publication

CC BY NC ND

Other information

Fields of science

Physical sciences; Chemical sciences; Electronic, automation and communications engineering, electronics; Materials engineering; Nanotechnology; Medical biotechnology

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company

DOI

10.1016/j.tsf.2013.11.112

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes