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ToF-SIMS 3d analysis of thin films deposited in high aspect ratio structures via atomic layer deposition and chemical vapor deposition

Year of publication

2019

Authors

Kia, Alireza M.; Haufe, Nora; Esmaeili, Sajjad; Mart, Clemens; Utriainen, Mikko; Puurunen, Riikka L.; Weinreich, Wenke

Organizations and authors

VTT Technical Research Centre of Finland Ltd

Utriainen Mikko Orcid -palvelun logo

Puurunen Riikka L.

Aalto University

Puurunen Riikka Orcid -palvelun logo

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal

Nanomaterials

Publisher

MDPI AG

Volume

9

Issue

7

Article number

1035

ISSN

2079-4991

​Publication forum

82604

​Publication forum level

1

Open access

Open access in the publisher’s service

Yes

Open access of publication channel

Fully open publication channel

Self-archived

Yes

Other information

Fields of science

Chemical engineering; Materials engineering; Nanotechnology

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company

No

DOI

10.3390/nano9071035

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes