Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition
Year of publication
2016
Authors
Mattinen, Miika; Hämäläinen, Jani; Gao, Feng; Jalkanen, Pasi; Mizohata, Kenichiro; Räisänen, Jyrki; Puurunen, Riikka L.; Ritala, Mikko; Leskelä, Markku
Organizations and authors
University of Helsinki
Hämäläinen Jani
Räisänen Jyrki
Mizohata Kenichiro
Leskelä Markku
Mattinen Miika
Ritala Mikko
Jalkanen Pasi
Publication type
Publication format
Article
Parent publication type
Journal
Article type
Original article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A1 Journal article (refereed), original researchPublication channel information
Open access
Open access in the publisher’s service
No
Self-archived
No
Other information
Fields of science
Physical sciences; Chemical sciences; Materials engineering
Keywords
[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
Publication country
United States
Internationality of the publisher
International
Language
English
International co-publication
No
Co-publication with a company
No
DOI
10.1021/acs.langmuir.6b03007
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes