Effects of post oxidation of SiO2/Si interfaces in ultrahigh vacuum below 450 °C
Year of publication
2022
Authors
Rad, Zahra Jahanshah; Lehtiö, Juha Pekka; Chen, Kexun; Mack, Iris; Vähänissi, Ville; Miettinen, Mikko; Punkkinen, Marko; Punkkinen, Risto; Suomalainen, Petri; Hedman, Hannu Pekka; Kuzmin, Mikhail; Kozlova, Jekaterina; Rähn, Mihkel; tart, university; Savin, Hele; Laukkanen, Pekka; Kokko, Kalevi
Show moreOrganizations and authors
University of Turku
Kokko Kalevi
Punkkinen Marko
Kuzmin Mikhail
Laukkanen Pekka
Hedman Hannu-Pekka
Suomalainen Petri
Punkkinen Risto
Publication type
Publication format
Article
Parent publication type
Journal
Article type
Original article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A1 Journal article (refereed), original researchPublication channel information
Open access
Open access in the publisher’s service
Yes
Open access of publication channel
Partially open publication channel
Self-archived
Yes
Other information
Fields of science
Physical sciences; Materials engineering
Keywords
[object Object],[object Object],[object Object],[object Object]
Internationality of the publisher
International
Language
English
International co-publication
Yes
Co-publication with a company
No
DOI
10.1016/j.vacuum.2022.111134
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes