Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition
Year of publication
2012
Authors
Puurunen, R. L.; Häärä, A.; Saloniemi, H.; Dekker, J.; Kainlauri, M.; Pohjonen, H.; Suni, T.; Kiihamäki, J.; Santala, E.; Leskelä, M.; Kattelus, H.
Organizations and authors
Publication type
Publication format
Article
Parent publication type
Journal
Article type
Original article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A1 Journal article (refereed), original researchPublication channel information
Journal/Series
Parent publication name
Volume
188
Pages
24-245
ISSN
Publication forum
Open access
Open access in the publisher’s service
No information
Self-archived
Unknown
Other information
Fields of science
Chemical sciences; Chemical engineering
Publication country
Switzerland
Internationality of the publisher
International
Language
English
International co-publication
No
Co-publication with a company
Unknown
DOI
10.1016/j.sna.2012.01.040
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes