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Efficient surface passivation of black silicon using spatial atomic layer deposition

Year of publication

2017

Authors

Heikkinen, Ismo; Repo, Päivikki; Vähänissi, Ville; Pasanen, Toni; Malinen, Ville; Savin, Hele

Organizations and authors

Aalto University

Savin Hele Orcid -palvelun logo

Repo Päivikki

Pasanen Toni Orcid -palvelun logo

Vähänissi Ville Orcid -palvelun logo

Publication type

Publication format

Article

Parent publication type

Conference

Article type

Other article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A4 Article in conference proceedings

Publication channel information

Journal/Series

Energy Procedia

Publisher

Elsevier

Volume

124

Pages

282–287

​Publication forum

70368

​Publication forum level

1

Open access

Open access in the publisher’s service

Yes

Open access of publication channel

Fully open publication channel

Self-archived

Yes

Other information

Fields of science

Nanotechnology

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

Yes

DOI

10.1016/j.egypro.2017.09.300

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes