undefined

< Back to search results

Titanium dioxide thin films by atomic layer deposition A review

Year of publication

2017

Authors

Niemelä, Janne Petteri; Marin, Giovanni; Karppinen, Maarit

Organizations and authors

Aalto University

Marin Giovanni Orcid -palvelun logo

Niemelä Janne-Petteri

Karppinen Maarit Orcid -palvelun logo

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Review article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A2 Review article, Literature review, Systematic review

Publication channel information

Journal

Semiconductor Science and Technology

Publisher

Institute of Physics Publishing

Volume

32

Issue

9

Article number

093005

ISSN

0268-1242

​Publication forum

66971

​Publication forum level

1

Open access

Open access in the publisher’s service

No

Self-archived

Yes

Other information

Fields of science

Chemical sciences

Keywords

[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

No

DOI

10.1088/1361-6641/aa78ce

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes