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Patterned films by atomic layer deposition using Parafilm as a mask

Year of publication

2018

Authors

Zhang, Chao; Kalliomäki, Jesse; Leskelä, Markku; Ritala, Mikko

Organizations and authors

University of Helsinki

Zhang Chao

Kalliomäki Jesse

Leskelä Markku

Ritala Mikko

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Parent publication name

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volume

36

Issue

1

Article number

ARTN 01B102

ISSN

Publication forum

Publication forum level

1

Open access

Open access in the publisher’s service

No

Self-archived

Yes

Other information

Fields of science

Chemical sciences; Nanotechnology

Keywords

[object Object],[object Object],[object Object],[object Object]

Publication country

United States

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

No

DOI

10.1116/1.5001033

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes