Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films

Year of publication

2018

Authors

Kukli, Kaupo; Kemell, Marianna; Castan, Helena; Duenas, Salvador; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Heikkilä, Mikko J.; Ritala, Mikko; Leskelä, Markku

Organizations and authors

University of Helsinki

Kukli Kaupo

Kemell Marianna

Leskelä Markku

Ritala Mikko

Heikkilä Mikko J.

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

ECS Journal of Solid State Science and Technology

Parent publication name

ECS Journal of Solid State Science and Technology

Volume

Issue

Pages

P287-P294

ISSN

2162-8769

Publication forum

75100

Publication forum level

Open access

Open access in the publisher’s service

Open access of publication channel

Partially open publication channel

Self-archived

Yes

Other information

Fields of science

Chemical sciences; Nanotechnology

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]

Publication country

United States

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company

DOI

10.1149/2.0021806jss

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes