Tensile strain in arsenic heavily-doped Si

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Tensile strain in arsenic heavily-doped Si

Year of publication

2007

Authors

Borot, G.; Rubaldo, L.; Clement, L.; Pantel, R.; Kuitunen, K.; Slotte, J.; Tuomisto, F.; Mescot, X.; Gri, M.; Ghibaudo, G.; Dutartre, D.

Organizations and authors

Aalto University

Tuomisto Filip Orcid -palvelun logo

Slotte Jonatan Orcid -palvelun logo

Kuitunen Katja

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal

Journal of Applied Physics

Publisher

American Institute of Physics

Volume

102

Issue

10

Article number

103505

Pages

1-5

ISSN

0021-8979

​Publication forum

59616

​Publication forum level

2

Open access

Open access in the publisher’s service

Yes

Open access of publication channel

Fully open publication channel

Self-archived

Yes

Other information

Keywords

As doped; Positron; Si; strain

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company

Yes

DOI

10.1063/1.2816251

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes
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