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Fluence, flux and implantation temperature dependence of ion implantation induced defect production in 4H-SiC

Year of publication

2005

Authors

Slotte, Jonatan; Janson, M.S.; Saarinen, Kimmo; Kuznetsov, A.Yu.; Hallén, A.; Wong-Leung, J.; Jagadish, C.; Svensson, B.G.

Organizations and authors

Aalto University

Slotte Jonatan

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Journal of Applied Physics

Publisher

American Institute of Physics

Volume

97

Issue

3

Pages

033513-033513-7

ISSN

Publication forum

Publication forum level

2

Open access

Open access in the publisher’s service

No

Self-archived

No

Other information

Keywords

[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

No

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes