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The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching Ion Etching

Year of publication

2009

Authors

Chekurov, Nikolai; Grigoras, Kestutis; Peltonen, Antti; Franssila, Sami; Tittonen, Ilkka

Organizations and authors

Aalto University

Tittonen Ilkka Orcid -palvelun logo

Franssila Sami Orcid -palvelun logo

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Nanotechnology

Publisher

Institute of Physics Publishing

Volume

20

Issue

6

Open access

Open access in the publisher’s service

No

Self-archived

No

Other information

Fields of science

Physical sciences; Chemical sciences; Electronic, automation and communications engineering, electronics; Materials engineering; Nanotechnology; Medical biotechnology

Keywords

[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

No

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes