Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films

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Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films

Year of publication

1993

Authors

Ritala, M.; Leskelä, M.; Niinistö, L.; Haussalo, P.

Organizations and authors

Aalto University

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal

Chemistry of Materials

Publisher

AMERICAN CHEMICAL SOCIETY

Volume

5

Pages

1174-1181

Open access

Open access in the publisher’s service

No

Self-archived

No

Other information

Keywords

atomic layer epitaxy (ALE); PRECURSOR; thin films; Titanium dioxide

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

No

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes
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