Atomic layer deposition (ALD) of high quality Ga2O3 thin films from a dimeric dialkylamido-bridged gallium complex
Year of publication
2005
Authors
Dezelah IV, Charles L.; Niinistö, Jaakko; Putkonen, Matti; Arstila, Kai; Winter, Charles H.; Niinistö, Lauri
Organizations and authors
Publication type
Publication format
Article
Parent publication type
Conference
Article type
Other article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A4 Article in conference proceedingsPublication channel information
Parent publication name
Publisher
American Vacuum Society
Open access
Open access in the publisher’s service
No
Self-archived
No
Other information
Keywords
[object Object],[object Object],[object Object]
Internationality of the publisher
International
Language
English
International co-publication
No
Co-publication with a company
No
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes