Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxy

Year of publication

1994

Authors

Ritala, Markku; Leskelä, M.; Niinistö, L.; Prohaska, T.; Friedbacher, G.; Grasserbauer, M.

Organizations and authors

Aalto University

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Thin Solid Films

Publisher

Elsevier

Volume

250

Pages

72-80

Open access

Open access in the publisher’s service

Self-archived

Other information

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

Co-publication with a company

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes