< Back to search results

Mask material effects in cryogenic deep reactive ion etching

Year of publication

2007

Authors

Franssila, Sami; Sainiemi, Lauri

Organizations and authors

Aalto University

Franssila Sami

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Journal of Vacuum Science and Technology. Part B.

Publisher

AVS Science and Technology Society

Volume

25

Issue

3

Pages

801-807

ISSN

Open access

Open access in the publisher’s service

Yes

Open access of publication channel

Fully open publication channel

Self-archived

Yes

Other information

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

No

DOI

10.1116/1.2734157

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes