undefined

< Back to search results

Controlled growth of HfO2 thin films by atomic layer deposition from cyclopentadienyl-type precursor and water

Year of publication

2005

Authors

Niinistö, Jaakko; Putkonen, Matti; Niinistö, Lauri; Stoll, Sarah; Kukli, Kaupo; Sajavaara, Timo; Ritala, Mikko; Leskelä, Markku

Organizations and authors

Aalto University

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal

Journal of Materials Chemistry

Publisher

Royal Society of Chemistry

Volume

15

Pages

2271-2275

Open access

Open access in the publisher’s service

No

Self-archived

No

Other information

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

No

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes