Dependence of the Anisotropy of Wet Chemical Etching of Silicon on the Amount of Surface Coverage by OH Radicals

Year of publication

2003

Authors

Gosálvez, Miguel A.; Foster, Adam S.; Nieminen, Risto M.

Organizations and authors

Aalto University

Foster Adam

Nieminen Risto

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

SENSORS AND MATERIALS

Publisher

M Y U Scientific Publishing Division

Volume

Issue

Pages

53-65

Open access

Open access in the publisher’s service

Self-archived

Other information

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

Co-publication with a company

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes