Silicon Surface Passivation by Al2O3: Effect of ALD Reactants

Year of publication

2011

Authors

Repo, Päivikki; Talvitie, Heli; Li, Shuo; Skarp, Jarmo; Savin, Hele

Organizations and authors

Aalto University

Savin Hele

Repo Päivikki

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Energy Procedia

Publisher

Elsevier

Volume

Pages

681-687

Open access

Open access in the publisher’s service

Yes

Open access of publication channel

Fully open publication channel

Self-archived

Yes

Other information

Fields of science

Physical sciences; Chemical sciences; Electronic, automation and communications engineering, electronics; Materials engineering; Nanotechnology; Medical biotechnology

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company

DOI

10.1016/j.egypro.2011.06.201

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes