Advanced cyclopentadienyl precursors for atomic layer deposition of ZrO2 thin films

Advanced cyclopentadienyl precursors for atomic layer deposition of ZrO2 thin films

Year of publication

2008

Authors

Niinistö, Jaakko; Kukli, Kaupo; Tamm, Aile; Putkonen, Matti; Dezelah IV, Charles L.; Niinistö, Lauri; Lu, Jun; Song, Fuquan; Williams, Paul; Heys, Peter N.; Ritala, Mikko; Leskelä, Markku

Organizations and authors

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Volume

18

Issue

28

Pages

3385-3390

​Publication forum

60943

​Publication forum level

3

Open access

Open access in the publisher’s service

No

Self-archived

No

Other information

Fields of science

Chemical sciences

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

No

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes

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