Fluorescence microscopy for quality control in nanoimprint lithography

Year of publication

2003

Authors

Finder, Ch.; Beck, M.; Seekamp, J.; Pfeiffer, K.; Carlberg, P.; Maximov, I.; Reuther, F.; Zankovych, S.; Sarwe, E.L.; Ahopelto, Jouni; Montelius, L.; Mayer, C.; Sotomayor Torres, C.M.

Organizations and authors

VTT Technical Research Centre of Finland Ltd

Ahopelto Jouni

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Microelectronic Engineering

Conference

28th International Conference on Micro- and Nano-Engineering

Volume

67-68

Pages

623-628

ISSN

0167-9317

Publication forum

63335

Publication forum level

Open access

Open access in the publisher’s service

Self-archived

Other information

Fields of science

Materials engineering

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]

Language

English

International co-publication

Yes

Co-publication with a company

Yes

DOI

10.1016/S0167-9317(03)00123-0