AlOx surface passivation of black silicon by spatial ALD: Stability under light soaking and damp heat exposure

Year of publication

2020

Authors

Heikkinen, Ismo T. S.; Koutsourakis, George; Virtanen, Sauli; Yli-Koski, Marko; Wood, Sebastian; Vähänissi, Ville; Salmi, Emma; Castro, Fernando A.; Savin, Hele

Organizations and authors

Aalto University

Savin Hele

Heikkinen Ismo

Yli-Koski Marko

Vähänissi Ville

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Journal of Vacuum Science and Technology A

Publisher

AVS Science and Technology Society

Volume

Issue

Article number

022401

ISSN

0734-2101

Publication forum

62085

Publication forum level

Open access

Open access in the publisher’s service

Self-archived

Yes

Other information

Fields of science

Electronic, automation and communications engineering, electronics

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company

Yes

DOI

10.1116/1.5133896

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes