Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS
Year of publication
2019
Authors
Kia, Alireza M.; Weinreich, Wenke; Utriainen, Mikko; Puurunen, Riikka L.; Haufe, Nora
Organizations and authors
Publication type
Publication format
Abstract
Parent publication type
Conference
Audience
Scientific
Publication channel information
Parent publication name
Conference
19th International Conference on Atomic Layer Deposition, ALD 2019
Publisher
American Vacuum Society (AVS)
Pages
61-61
Open access
Open access in the publisher’s service
Yes
Self-archived
No
Other information
Fields of science
Electronic, automation and communications engineering, electronics
Keywords
[object Object]
Language
English
International co-publication
Yes
Co-publication with a company
No
The publication is included in the Ministry of Education and Culture’s Publication data collection
No