Atomic Layer Deposition of Insulating AlF3/Polyimide Nanolaminate Films
Year of publication
2021
Authors
Li, Xinzhi; Vehkamaki, Marko; Heikkila, Mikko; Mattinen, Miika; Putkonen, Matti; Leskela, Markku; Ritala, Mikko
Organizations and authors
University of Helsinki
Leskela Markku
Vehkamaki Marko
Putkonen Matti
Mattinen Miika
Heikkila Mikko
Ritala Mikko
Li Xinzhi
Publication type
Publication format
Article
Parent publication type
Journal
Article type
Original article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A1 Journal article (refereed), original researchPublication channel information
Open access
Open access in the publisher’s service
Yes
Open access of publication channel
Fully open publication channel
Self-archived
Yes
License of the self-archived publication
CC BY
Other information
Fields of science
Nanotechnology
Keywords
[object Object],[object Object],[object Object],[object Object]
Publication country
Switzerland
Internationality of the publisher
International
Language
English
International co-publication
Yes
Co-publication with a company
No
DOI
10.3390/coatings11030355
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes