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Residual stress in thin films made by atomic layer deposition

Year of publication

2016

Authors

Ylivaara, Oili; Puurunen, Riikka

Organizations and authors

VTT Technical Research Centre of Finland Ltd

Ylivaara Oili Orcid -palvelun logo

Puurunen Riikka

Publication type

Publication format

Poster

Parent publication type

Conference

Audience

Scientific

Publication channel information

Conference

HERALD WG2 Workshop & 4th Annual Seminar of Finnish Center of Excellence in Atomic Layer Deposition (ALDCoE)

Open access

Open access in the publisher’s service

No

Self-archived

No

Other information

Fields of science

Electronic, automation and communications engineering, electronics; Materials engineering

Keywords

[object Object],[object Object],[object Object]

Language

English

International co-publication

No

Co-publication with a company

No

The publication is included in the Ministry of Education and Culture’s Publication data collection

No