On the early history of atomic layer deposition: most significant works and applications
Year of publication
2016
Authors
Aarik, Jaan; Ahvenniemi, Esko; Akbashev, Andrew R.; Ali, Saima; Bechelany, Mikhael; Berdova, Maria; Cameron, David; Chekurov, Nikolai; Chubarov, Mikhail; Drozd, Viktor; Elliott, Simon; Gottardi, Gloria; Grigoras, Kestutis; Hwang, Cheol Seong; Junige, Marcel; Kallio, Tanja; Kanervo, Jaana; Khmelnitskiy, Ivan; Koshtyal, Yury; Krause, Outi; Kääriäinen, Marja-Leena; Kääriäinen, Tommi; Lamagna, Luca; Lipsanen, Harri; Lyytinen, Jussi; Malkov, Anatoly; Malygin, Anatoly; Molarius, Jyrki; Norek, Malgorzata; Ozgit-Akgun, Cagla; Panov, Mikhail; Pedersen, Henrik; Piallat, Fabien; Popov, Georgi; Puurunen, Riikka L.; Pyymaki-Perros, Alexander; Ras, Robin H. A.; Roozeboom, Fred; Sajavaara, Timo; Savin, Hele; Seidel, Thomas E.; Sundberg, Pia; Sundqvist, Jonas; Suyatin, Dmitry; Tallarida, Massimo; Törndahl, Tobias; Utriainen, Mikko; van Ommen, J. Ruud; Wächtler, Thomas; Wiemer, Claudia; Ylivaara, Oili M. E.; Yurkevich, Oksana
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Publication type
Publication format
Poster
Parent publication type
Conference
Audience
Scientific
Publication channel information
Parent publication name
16th International Conference on Atomic Layer Deposition, ALD 2016
Conference
16th International Conference on Atomic Layer Deposition, ALD 2016
Open access
Open access in the publisher’s service
No
Self-archived
No
Other information
Fields of science
Physical sciences; Chemical sciences; Electronic, automation and communications engineering, electronics
Language
English
International co-publication
Yes
Co-publication with a company
Yes
The publication is included in the Ministry of Education and Culture’s Publication data collection
No