Study on Al<sub>2</sub>O<sub>3</sub> film in anhydrous HF vapor
Year of publication
2012
Authors
Ritala, Heini; Tuohiniemi, Mikko
Organizations and authors
Publication type
Publication format
Article
Parent publication type
Conference
Article type
Other article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A4 Article in conference proceedingsPublication channel information
Journal/Series
Conference
10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2010
Pages
45-48
ISSN
Publication forum
Publication forum level
1
Open access
Open access in the publisher’s service
No
Self-archived
No
Other information
Keywords
[object Object],[object Object],[object Object]
Language
English
International co-publication
No
Co-publication with a company
No
DOI
10.4028/www.scientific.net/SSP.187.45
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes