Development and characterization of imprint-resists as masks for plasma etching
Year of publication
2002
Authors
Cardinaud, C.; Gaboriau, F.; Bousquet, A.; Pfeiffer, K.; Reuther, F.; Fink, M.; Grueztner, G.; Shultz, H.; Scheer, H.C.; Sotomayor Torres, C.M.; Montelius, L.; Mayer, C.; Ahopelto, Jouni
Organizations and authors
VTT Technical Research Centre of Finland Ltd
Ahopelto Jouni
Publication type
Publication format
Abstract
Parent publication type
Conference
Audience
Scientific
Publication channel information
Parent publication name
Conference
1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02
Publisher
Naval Research Laboratory
Pages
152-153
Open access
Open access in the publisher’s service
No
Self-archived
No
International co-publication
No
Co-publication with a company
No
The publication is included in the Ministry of Education and Culture’s Publication data collection
No