undefined

Perspectives on Black Silicon in Semiconductor Manufacturing: Experimental Comparison of Plasma Etching, MACE and Fs-Laser Etching

Year of publication

2022

Authors

Liu, Xiaolong; Radfar, Behrad; Chen, Kexun; Setälä, Olli; Pasanen, Toni; Yli-Koski, Marko; Savin, Hele; Vähänissi, Ville

Organizations and authors

Aalto University

Radfar Behrad Orcid -palvelun logo

Savin Hele Orcid -palvelun logo

Chen Kexun Orcid -palvelun logo

Yli-Koski Marko Orcid -palvelun logo

Setälä Olli Orcid -palvelun logo

Pasanen Toni Orcid -palvelun logo

Vähänissi Ville Orcid -palvelun logo

Liu Xiaolong Orcid -palvelun logo

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Publisher

IEEE

Volume

35

Issue

3

Pages

504-510

​Publication forum

57576

​Publication forum level

1

Open access

Open access in the publisher’s service

Yes

Open access of publication channel

Partially open publication channel

Self-archived

Yes

Other information

Fields of science

Materials engineering

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

No

DOI

10.1109/TSM.2022.3190630

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes