Perspectives on Black Silicon in Semiconductor Manufacturing: Experimental Comparison of Plasma Etching, MACE and Fs-Laser Etching
Year of publication
2022
Authors
Liu, Xiaolong; Radfar, Behrad; Chen, Kexun; Setälä, Olli; Pasanen, Toni; Yli-Koski, Marko; Savin, Hele; Vähänissi, Ville
Organizations and authors
Publication type
Publication format
Article
Parent publication type
Journal
Article type
Original article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A1 Journal article (refereed), original researchPublication channel information
Journal/Series
Publisher
Volume
35
Issue
3
Pages
504-510
ISSN
Publication forum
Publication forum level
1
Open access
Open access in the publisher’s service
Yes
Open access of publication channel
Partially open publication channel
Self-archived
Yes
Other information
Fields of science
Materials engineering
Internationality of the publisher
International
Language
English
International co-publication
No
Co-publication with a company
No
DOI
10.1109/TSM.2022.3190630
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes