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Inherent Area-Selective Atomic Layer Deposition of ZnS

Year of publication

2023

Authors

Zhang, Chao; Vehkamäki, Marko; Leskelä, Markku; Ritala, Mikko

Organizations and authors

University of Helsinki

Zhang Chao

Leskelä Markku

Vehkamäki Marko

Ritala Mikko

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Dalton Transactions

Parent publication name

Dalton Transactions

Volume

52

Pages

9622-9630

​Publication forum

54513

​Publication forum level

1

Open access

Open access in the publisher’s service

Yes

Open access of publication channel

Partially open publication channel

License of the publisher’s version

CC BY

Self-archived

No

Other information

Fields of science

Chemical sciences

Publication country

United Kingdom

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

No

DOI

10.1039/d3dt01435e

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes