Area-Selective Atomic Layer Deposition and Area-Selective Etching for Self-aligned Patterning
Year of publication
2023
Authors
Zhang, Chao
Organizations and authors
University of Helsinki
Zhang Chao
Publication type
Publication format
Monograph
Audience
Scientific
MINEDU's publication type classification code
G5 Doctoral dissertation (articles)
Publication channel information
Publisher
Helsingin yliopisto
ISBN
Open access
Open access in the publisher’s service
Yes
Open access of publication channel
Fully open publication channel
Self-archived
No
Other information
Fields of science
Chemical sciences; Electronic, automation and communications engineering, electronics; Chemical engineering; Materials engineering; Nanotechnology
Publication country
Finland
Internationality of the publisher
Domestic
Language
English
International co-publication
No
Co-publication with a company
No
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes