Atomic Layer Deposition of ScF<sub>3</sub> and Sc<sub>x</sub>Al <sub>y</sub>F<sub>z</sub> Thin Films
Year of publication
2024
Authors
Atosuo, Elisa; Heikkilä, Mikko; Majlund, Johanna; Pesonen, Leevi; Mäntymäki, Miia; Mizohata, Kenichiro; Leskelä, Markku; Ritala, Mikko
Organizations and authors
University of Helsinki
Atosuo Elisa
Majlund Johanna
Mizohata Kenichiro
Pesonen Leevi
Leskelä Markku
Mäntymäki Miia
Heikkilä Mikko
Ritala Mikko
Publication type
Publication format
Article
Parent publication type
Journal
Article type
Original article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A1 Journal article (refereed), original researchPublication channel information
Open access
Open access in the publisher’s service
Yes
Open access of publication channel
Fully open publication channel
Self-archived
No
Article processing fee (EUR)
1792
Year of payment for the open publication fee
2024
Other information
Fields of science
Chemical sciences
Publication country
United States
Internationality of the publisher
International
Language
English
International co-publication
No
Co-publication with a company
No
DOI
10.1021/acsomega.3c09147
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes