1D Crystallographic Etching of Few-Layer WS<sub>2</sub>
Year of publication
2024
Authors
Li, Shisheng; Lin, Yung Chang; Chiew, Yiling; Dai, Yunyun; Ning, Zixuan; Zhang, Yaming; Nakajima, Hideaki; Lim, Hong En; Wu, Jing; Neitoh, Yasuhisa; Okazaki, Toshiya; Sun, Yang; Sun, Zhipei; Suenaga, Kazu; Sakuma, Yoshiki; Tsukagoshi, Kazuhito; Taniguchi, Takaaki
Show moreOrganizations and authors
Publication type
Publication format
Article
Parent publication type
Journal
Article type
Original article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A1 Journal article (refereed), original researchPublication channel information
Journal
Publisher
Volume
34
Issue
46
Article number
2405665
ISSN
Publication forum
Publication forum level
3
Open access
Open access in the publisher’s service
No
Self-archived
Yes
Other information
Fields of science
Materials engineering
Internationality of the publisher
International
Language
English
International co-publication
Yes
Co-publication with a company
No
DOI
10.1002/adfm.202405665
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes