Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperatures
Year of publication
2011
Authors
Hämäläinen, Jani; Hatanpää, Timo Tapio; Puukilainen, Esa; Sajavaara, Timo; Ritala, Mikko; Leskelä, Markku
Organizations and authors
University of Helsinki
Puukilainen Esa
Hämäläinen Jani
Leskelä Markku
Ritala Mikko
Hatanpää Timo Tapio
Publication type
Publication format
Article
Parent publication type
Journal
Article type
Original article
Audience
ScientificPeer-reviewed
Peer-ReviewedMINEDU's publication type classification code
A1 Journal article (refereed), original researchPublication channel information
Journal
Publisher
Volume
21
Issue
41
Pages
16488-16493
ISSN
Publication forum
Open access
Open access in the publisher’s service
No
Self-archived
No
Other information
Fields of science
Physical sciences; Chemical sciences
Keywords
[object Object]
Publication country
United Kingdom
Internationality of the publisher
International
Language
English
International co-publication
Yes
Co-publication with a company
No
DOI
10.1039/C1JM12245B
The publication is included in the Ministry of Education and Culture’s Publication data collection
Yes