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Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications

Year of publication

2012

Authors

Ryynänen, Tomi; Ylä-Outinen, Laura; Narkilahti, Susanna; Tanskanen, Jarno M. A.; Hyttinen, Jari; Hämäläinen, Jani; Leskelä, Markku; Lekkala, Jukka

Organizations and authors

University of Helsinki

Hämäläinen Jani

Leskelä Markku

Tampere University

Tuntematon

Hyttinen Jari

Tanskanen Jarno M.A.

Lekkala Jukka

Ryynänen Tomi

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal

Journal of vacuum science and technology a

Parent publication name

Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films

Volume

Jul/Aug 212

Article number

4151

ISSN

0734-2101

​Publication forum

62085

Open access

Open access in the publisher’s service

No

Self-archived

Unknown

Other information

Fields of science

Chemical sciences; Medical engineering; Other engineering and technologies; Medical biotechnology; Neurosciences

Publication country

United States

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

Unknown

DOI

10.1116/1.4709447

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes