Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Year of publication

2012

Authors

Kukli, Kaupo; Aarik, Jaan; Aidla, Aleks; Jogi, Indrek; Arroval, Tonis; Lu, Jun; Sajavaara, Timo; Laitinen, Mikko; Kiisler, Alma-Asta; Ritala, Mikko; Leskelä, Markku; Peck, John; Natwora, Jim; Geary, Joan; Spohn, Ronald; Meiere, Scott; Thompson, David M.

Organizations and authors

University of Jyväskylä

Laitinen Mikko

Sajavaara Timo

University of Helsinki

Kukli Kaupo

Leskelä Markku

Ritala Mikko

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Volume

520

Issue

Pages

2756-2763

ISSN

0040-6090

Publication forum

68419

Open access

Open access in the publisher’s service

Self-archived

Other information

Fields of science

Physical sciences; Chemical sciences

Keywords

[object Object]

Publication country

Switzerland

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company

DOI

10.1016/j.tsf.2011.11.088

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes