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Atomic Layer Deposition of LiF Thin Films from Lithd, Mg(thd)(2), and TiF4 Precursors

Year of publication

2013

Authors

Mäntymäki, Miia; Hämäläinen, Jani; Puukilainen, Esa; Sajavaara, Timo; Ritala, Mikko; Leskelä, Markku

Organizations and authors

University of Jyväskylä

Sajavaara Timo Orcid -palvelun logo

University of Helsinki

Puukilainen Esa

Hämäläinen Jani

Leskelä Markku

Mäntymäki Miia

Ritala Mikko

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Chemistry of materials

Parent publication name

Chemistry of Materials

Publisher

American Chemical Society

Volume

25

Issue

9

Pages

1656-1663

ISSN

0897-4756

​Publication forum

53342

​Publication forum level

3

Open access

Open access in the publisher’s service

No

Self-archived

No

Other information

Fields of science

Physical sciences; Chemical sciences; Mechanical engineering

Keywords

[object Object],[object Object]

Publication country

United States

Internationality of the publisher

International

Language

English

International co-publication

No

Co-publication with a company

No

DOI

10.1021/cm400046w

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes