Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Year of publication

2014

Authors

Putkonen, Matti; Bosund, Markus; Ylivaara, Oili M E; L.Puurunen, Riikka; Kilpi, Lauri; Ronkainen, Helena; Sintonen, Sakari; Ali, Saima; Lipsanen, Harri K.; Liu, Xuwen; Haimi, Eero; Hannula, Simo Pekka; Sajavaara, Timo; Buchanan, Iain; Karwacki, Eugene J.; Vähä-Nissi, Mika

Organizations and authors

University of Jyväskylä

Sajavaara Timo

Aalto University

Haimi Eero

Lipsanen Harri

Putkonen Matti

Ylivaara Oili

Puurunen Riikka

Ali Saima

Sintonen Sakari

Hannula Simo-Pekka

Liu Xuwen

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Thin solid films

Publisher

Elsevier

Volume

558

Issue

May

Pages

93-98

ISSN

0040-6090

Publication forum

68419

Publication forum level

Open access

Open access in the publisher’s service

Self-archived

Other information

Fields of science

Physical sciences; Chemical sciences; Electronic, automation and communications engineering, electronics; Materials engineering; Nanotechnology; Medical biotechnology

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]

Publication country

Netherlands

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company

Yes

DOI

10.1016/j.tsf.2014.02.087

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes