Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films

Year of publication

2017

Authors

Broas, Mikael; Jiang, Hua; Graff, Andreas; Sajavaara, Timo; Vuorinen, Vesa; Paulasto-Kröckel, Mervi

Organizations and authors

Aalto University

Jiang Hua

Paulasto-Kröckel Mervi

Broas Mikael

Vuorinen Vesa

University of Jyväskylä

Sajavaara Timo

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Applied physics letters

Publisher

American Institute of Physics

Volume

111

Issue

Article number

141606

Pages

1-4

Publication forum

51518

Publication forum level

Open access

Open access in the publisher’s service

Self-archived

Yes

Other information

Fields of science

Physical sciences; Electronic, automation and communications engineering, electronics

Identified topic

[object Object]

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes