Effect of ozone concentration on silicon surface passivation by atomic layer deposited Al2O3

Year of publication

2015

Authors

von Gastrow, Guillaume; Li, Shuo; Putkonen, Matti; Laitinen, Mikko; Sajavaara, Timo; Savin, Hele

Organizations and authors

Aalto University

von Gastrow Guillaume

Savin Hele

Putkonen Matti

University of Jyväskylä

Laitinen Mikko

Sajavaara Timo

VTT Technical Research Centre of Finland Ltd

Putkonen Matti

Publication type

Publication format

Article

Parent publication type

Journal

Article type

Original article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A1 Journal article (refereed), original research

Publication channel information

Journal/Series

Applied surface science

Publisher

Elsevier BV * North-Holland

Volume

357, Part B

Pages

2402-2407

ISSN

0169-4332

Publication forum

51536

Publication forum level

Open access

Open access in the publisher’s service

Self-archived

Yes

Other information

Fields of science

Physical sciences; Chemical sciences; Electronic, automation and communications engineering, electronics; Materials engineering

Keywords

[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]

Internationality of the publisher

International

Language

English

International co-publication

Co-publication with a company

DOI

10.1016/j.apsusc.2015.09.263

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes